Development and sales of semiconductor manufacturing systems in Japan

Fully automatic Mask Cleaning System TWC-200A

  • Fully automatic Mask Cleaning System TWC-200A

– Domestic sales only –


The fully automatic TWC-200A mask cleaning system automatically removes resist residue and particles larger than 1 μm that adhere to the mask.


The fully automatic TWC-200A Cassette to Cassette mask cleaning system can be used with the specified chemicals to achieve greater productivity.


The drying process is based on heated deionized water drying, instead of conventional air knife drying. The design does not require adjustments for water splashes. Hot-DI Water dry


Supports mask sizes up to 7 inches. Simply press the Start button after inserting a cassette onto the machine (maximum cassette capacity: 20 pieces).

Specifications


Electricity 200V 3p
Dimension 1,760mm(W) × 900mm(D) × 2,050mm(H)
Weight Approx. 550Kg

Features


・Ensures complete removal of resist and resist residue.

・Ensures complete removal of particles exceeding 2 μm.

・The mask is permanent.

・The latest dedicated chemicals are mild and eco-friendly.

・Eliminates the hazards associated with handling hot sulfuric acid and sulfuric acid-hydrogen peroxide (Piranha clean).

・Scrub washing does not scratch mask surfaces.

・Standalone system accommodates double-sided mask cleaning.

・Compact dimensions save space.


*The masks assume change when xpose 100 times a day and 5 or 6 kinds of masks are used for the one product.It calculated for 50,000 to 80,000 yen a mask.


Before→After

Uses


■Best suited for cleaning of photomask larger than 2μm design rule L / S(Line and space)

such as FPD (flat panel display), MEMS devices, fine patterns PCB / FPC / TAB, compound semiconductor, electronic components and thin film.

Wash & Rinse


Wash&Rinse

Particle check Data/Resist Residue

Products

Wet Cleaning System

Cassette Cleaning System

  TCC-803 -Domestic Only-

Photomask Cleaning System

  TWE-200

  TW-300

  TW-700

  TW-1000 -Domestic Only-

  TWC-302 -Domestic Only-

Fully Automatic Photomask Cleaning System -Domestic Only-

  TWC-200A -Domestic Only-

  TWC-304A -Domestic Only-

Simple Cleaning Units
-Domestic Only-

  Chemical unit -Domestic Only-

  Scrub unit -Domestic Only-

  Dry unit -Domestic Only-

Cleaning Chemicals

Super Clean Heaters -Domestic Only-

for DI water
-Domestic Only-

  QH series

for Inert Gas/Clean Dry Air
-Domestic Only-

  SH series

Simple temperature controller
-Domestic Only-

  TC-2030

UV Ozone Cleaner

Wafer Mounter

Manual Wafer Mounter

  FM-224 series

Semi-Automatic Wafer Mounter

  FM-3343

  FM-903S

  FM-664 series

Wafer Expander

Grip Ring

UV Curing System

UV-LED type

  UVC-200/300

  UVC-200A/300A
-Domestic Only-

  UVC-708

High-Pressure Hg Lamp type

  UVC-408

  UVC-512