Development and sales of semiconductor manufacturing systems in Japan

Hot-DI Water dry

  • Hot-DI Water dry

Hot-DI Water dry method is one of the method to dry photo mask or glass. This method is using Hot DI Water and surface tension. Work piece is traveled away from the pot which filled with Hot DI Water.

Features


Features
1 Simple utility, only water & electrical power.
2 No IPA, No large volume CDA.
3 Final rinse effect is expected.
4 Simple mechanism, easy maintenance.

Products

Wet Cleaning System

Cassette Cleaning System

  TCC-803 -Domestic Only-

Photomask Cleaning System

  TWE-200

  TW-300

  TW-700

  TW-1000 -Domestic Only-

  TWC-302 -Domestic Only-

Fully Automatic Photomask Cleaning System -Domestic Only-

  TWC-200A -Domestic Only-

  TWC-304A -Domestic Only-

Simple Cleaning Units
-Domestic Only-

  Chemical unit -Domestic Only-

  Scrub unit -Domestic Only-

  Dry unit -Domestic Only-

Cleaning Chemicals

Super Clean Heaters -Domestic Only-

for DI water
-Domestic Only-

  QH series

for Inert Gas/Clean Dry Air
-Domestic Only-

  SH series

Simple temperature controller
-Domestic Only-

  TC-2030

UV Ozone Cleaner

Wafer Mounter

Manual Wafer Mounter

  FM-224 series

Semi-Automatic Wafer Mounter

  FM-3343

  FM-903S

  FM-664 series

Wafer Expander

Grip Ring

UV Curing System

UV-LED type

  UVC-200/300

  UVC-200A/300A
-Domestic Only-

  UVC-708

High-Pressure Hg Lamp type

  UVC-408

  UVC-512