Development and sales of semiconductor manufacturing systems in Japan

Photomask Cleaning System TW-1000

  • Photomask Cleaning System TW-1000

– Domestic sales only –


Cleaned photomasks are essential to improve product yields.
Technovision’s expertise in cleaning and drying techniques helps you maintain high standards of cleanness for any procedure involving photomasks.


The Photomask Cleaning System is available in four models that can be used with a wide range of small to large photomasks.

Specifications


Size Cleans devices up to 1,300mm × 1,700mm
Dimensions 17,200mm(W) × 1,200mm(D) × 2,700mm(H)

Features


■Main features

Features
1 Precise and scratch-free cleaning with special brushes.
2 Ideal design for double-sided cleaning.
3 Photomasks are loaded and transported vertically to minimize the stress during transportation.
4 Best suited to low-volume production of various devices and R&D.

Uses


Photomasks:Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates.

Products

Wet Cleaning System

Cassette Cleaning System

  TCC-803 -Domestic Only-

Photomask Cleaning System

  TWE-200

  TW-300

  TW-700

  TW-1000 -Domestic Only-

  TWC-302 -Domestic Only-

Fully Automatic Photomask Cleaning System -Domestic Only-

  TWC-200A -Domestic Only-

  TWC-304A -Domestic Only-

Simple Cleaning Units
-Domestic Only-

  Chemical unit -Domestic Only-

  Scrub unit -Domestic Only-

  Dry unit -Domestic Only-

Cleaning Chemicals

Super Clean Heaters -Domestic Only-

for DI water
-Domestic Only-

  QH series

for Inert Gas/Clean Dry Air
-Domestic Only-

  SH series

Simple temperature controller
-Domestic Only-

  TC-2030

UV Ozone Cleaner

Wafer Mounter

Manual Wafer Mounter

  FM-224 series

Semi-Automatic Wafer Mounter

  FM-3343

  FM-903S

  FM-664 series

Wafer Expander

Grip Ring

UV Curing System

UV-LED type

  UVC-200/300

  UVC-200A/300A
-Domestic Only-

  UVC-708

High-Pressure Hg Lamp type

  UVC-408

  UVC-512