– Domestic sales only –
Cleaned photomasks are essential to improve product yields.
Technovision’s expertise in cleaning and drying techniques helps you maintain high standards of cleanness for any procedure involving photomasks.
The Photomask Cleaning System is available in four models that can be used with a wide range of small to large photomasks.
| Size | Cleans devices up to 1,300mm × 1,700mm |
|---|---|
| Dimensions | 17,200mm(W) × 1,200mm(D) × 2,700mm(H) |
■Main features
| Features | |
|---|---|
| 1 | Precise and scratch-free cleaning with special brushes. |
| 2 | Ideal design for double-sided cleaning. |
| 3 | Photomasks are loaded and transported vertically to minimize the stress during transportation. |
| 4 | Best suited to low-volume production of various devices and R&D. |
Photomasks:Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates.