– Domestic sales only –
Cleaned photomasks are essential to improve product yields.
Technovision’s expertise in cleaning and drying techniques helps you maintain high standards of cleanness for any procedure involving photomasks.
The TWC-302 offers two tanks for mask cleaning equipment. Masks are brush-scrubbed and rinsed in the first tank for removing particles adhering to the mask.
The process in the second tank is hot DIW drying, a simple, superior quality drying system.
| Mask size | up to 14×14 inch |
|---|---|
| Size | 1,480mm(W) × 1,370mm(D) × 2,120mm(H) |
| Weight | Approx. 600kg |
■Main features
| Features | |
|---|---|
| 1 | Precise and scratch-free cleaning with special brushes. |
| 2 | Ideal design for double-sided cleaning. |
| 3 | Compact footprint. |
| 4 | Best suited to low-volume production of various devices and R&D. |
| 5 | Hot DIW drying process. |
Photomasks:Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates.