Development and sales of semiconductor manufacturing systems in Japan

Chemicals

  • Chemicals
  • Chemicals

Technovision’s photomask cleaning chemical is specialized for removal of resist residues or particles.

Line up


for Removal of resist residue

Chemical Remover TRC-1811 Organic Alkali

Chemical Cleaner TRC-170 Organic Alkali

 

for Removal of particle

TRC-123 Inorganic Alkali surfactant

TRC-151 Neutral surfactant

Products

Wet Cleaning System

Cassette Cleaning System

  TCC-803 -Domestic Only-

Photomask Cleaning System

  TWE-200

  TW-300

  TW-700

  TW-1000 -Domestic Only-

  TWC-302 -Domestic Only-

Fully Automatic Photomask Cleaning System -Domestic Only-

  TWC-200A -Domestic Only-

  TWC-304A -Domestic Only-

Simple Cleaning Units
-Domestic Only-

  Chemical unit -Domestic Only-

  Scrub unit -Domestic Only-

  Dry unit -Domestic Only-

Cleaning Chemicals

Super Clean Heaters -Domestic Only-

for DI water
-Domestic Only-

  QH series

for Inert Gas/Clean Dry Air
-Domestic Only-

  SH series

Simple temperature controller
-Domestic Only-

  TC-2030

UV Ozone Cleaner

Wafer Mounter

Manual Wafer Mounter

  FM-224 series

Semi-Automatic Wafer Mounter

  FM-3343

  FM-903S

  FM-664 series

Wafer Expander

Grip Ring

UV Curing System

UV-LED type

  UVC-200/300

  UVC-200A/300A
-Domestic Only-

  UVC-708

High-Pressure Hg Lamp type

  UVC-408

  UVC-512