Development and sales of semiconductor manufacturing systems in Japan

UV Ozone Cleaner UV-208

  • UV Ozone Cleaner UV-208

The UV (Ultraviolet) Ozone Cleaner removes molecular organic contaminants from workpiece surfaces and can also be used for surface modifications via UV radiation at wavelengths of 184.9 nm and 253.7 nm.

Surface treatment technology based on UV light is a dry cleaning technology that requires no vacuum system and can achieve reliable cleaning without failure. It also has the advantage of not damaging delicate workpiece surfaces. UV Ozone cleaner is also effective for precleaning, postcleaning, and final cleaning in wet processes.

This simple system for dry cleaning does not require a complicated structure and is ideal for final cleaning.


Exposure area 206mm x 206mm
Electricity 100VAC 5A 50 or 60 Hz
Dimensions 385mm(W) x 480mm(D) x 270mm(H)
Weight Approx. 28kg


1 Equipped with a high-density UV serpentine-style grid lamp
2 Expose uniformly to the workpiece surface.
3 Small, compact design
4 Simple utility
5 Simple operation with safety lock function
high-density UV grid lamp
high-density UV grid lamp


Through UV ozone cleaning / surface modification by UV exposure, organic substances on the surface are removed. In other words, the surface is changed from hydrophobic to hydrophilic.

You can observe this by changing wettability through water drop.

■Change of wettability and contact angle through water drop

Before exposure→After exposure

■Change of wettability

Change of wettability

■Change of contact angle

Change of contact angle
Exposure time 5min/ distance: 10mm
Tool UV-208/Sample: Si wafer


1 Surface modification of resin sections.
2 Improved contactabilty, enabling better adherence, coating, printing, deposition, and soldering.
3 Improvement of work surface wettability.
4 For cleaning wafers, photomasks, glass substrates, lenses and optical components.

UV Ozone Cleaning Mechanism

Ozone generation Ozone is generated by oxygen in the atmosphere, which absorbs ultraviolet rays of 184.9 nm.
Ozonolysis Generated-ozone generates oxygen and atomic oxygen to absorb ultraviolet rays of 253.7 nm.
Decomposition of organic matter Highly unstable active oxygen tied to organic compound and do oxidative decomposition such as H2O, CO2, and NOx.
UV Ozone Cleaning Mechanism
UV ozone


Wet Cleaning System

Cassette Cleaning System

  TCC-803 -Domestic Only-

Photomask Cleaning System




  TW-1000 -Domestic Only-

  TWC-302 -Domestic Only-

Fully Automatic Photomask Cleaning System -Domestic Only-

  TWC-200A -Domestic Only-

  TWC-304A -Domestic Only-

Simple Cleaning Units
-Domestic Only-

  Chemical unit -Domestic Only-

  Scrub unit -Domestic Only-

  Dry unit -Domestic Only-

Cleaning Chemicals

Super Clean Heaters -Domestic Only-

for DI water
-Domestic Only-

  QH series

for Inert Gas/Clean Dry Air
-Domestic Only-

  SH series

Simple temperature controller
-Domestic Only-


UV Ozone Cleaner

Wafer Mounter

Manual Wafer Mounter

  FM-224 series


Semi-Automatic Wafer Mounter



  FM-664 series

Wafer Expander

Grip Ring

UV Curing System

UV-LED type


-Domestic Only-


High-Pressure Hg Lamp type