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Technovision TOP > Products > Fully automatic Mask Cleaning System TWC-200A
Mask Cleaning System TWC-200A

"TWC-200A" fully automatic mask cleaning system is a cleaning equipment to remove the resist residues and larger than 1μm particles adhering to the mask automatically.

"TWC-200A" Cassette to cassette fully automatic mask cleaning system which is supported for dedicated chemicals.
It has been achieved to improved productivity.

The drying adopted the heated deionized water drying from the conventional air knife drying. It is designed with no need for adjustment of water splashes.

Supports mask size up to 7 inches maximum. Just press the "Start" button after the device was set to cassette that can be set only 20 pieces.

Replenishment chemicals will be "swapped in the state of liquid tank purchased". It is the work of the cap replacement.
Chemical is available in four types, we propose something that fits your needs.

200V    3p
Approx. 550Kg

      Fully automatic mask cleaning system
Mask cleaning system
  • The cost of about 10M yen is reduced every month.*
  • Complete removal of Resist and Resist residues.
  • Complete removal of particles larger than 1 μm
  • The mask can be permanently used
  • The latest developed chemical is eco friendly and mild
  • Release from the danger Hot sulfuric acid
    and Sulfuric acid-hydrogen peroxide(Piranha clean)
  • Scrub washing is non-scratch washing on Mask surface
  • Stand-alone system suitable double-sided Mask cleaning
  • Space saving

*The masks assume change when xpose 100 times a day and
5 or 6 kinds of masks are used for the one product.
It calculated for 50,000 to 80,000 yen a mask.


■Best suited for cleaning of photomask larger than 1μm design rule L / S(Line and space)

such as FPD (flat panel display), MEMS devices, fine patterns PCB / FPC / TAB, compound semiconductor, electronic components and thin film.