Clean photomasks are essential for improved product yield. Technovision's expertise in cleaning and drying techniques
helps you maintain high standards of cleanness for any procedure involving photomasks.
The Photomask Cleaning System is available in four models that can be used with a wide range of small to large photomasks.
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Features
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| 1 |
Allows fast scrub cleaning, rinsing, and drying of photomasks, all with a single system.
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| 2 |
2 Provides even, precise cleaning with special brushes that leave no scratches on mask patterns.
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| 3 |
Vertically places and transports photomasks to minimize stress during transport.
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| 4 |
Most suited to cleaning of substrates for low-volume production of various devices and R&D.
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Equipped with dedicated work holders for individual sizes and free-size work holders. Parts that come in contact with workpieces are made of plastic.
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Photomasks: |
Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates. |
■Options
Surfactant injection unit, HEPA/ULPA unit, ionizer, hot air knife, and DI water heating unit
Upright Compact Model |
| Model TW-200 |
| Size |
Cleans devices up to 300 mm×300 mm
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| Dimensions |
700 mm (W)×900 mm (D)×1,570 mm (H)
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| Work height |
1,040mm
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| Weight |
250Kg
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| Model TW-300 |
| Size |
Cleans devices up to 360 mm×460 mm
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| Dimensions |
1,070 mm (W)×700 mm (D)×1,815 mm (H)
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| Work height |
1,200mm
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| Weight |
280Kg
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| Model TW-700 |
| Size |
Cleans devices up to 620 mm×720 mm
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| Dimensions |
1,810 mm (W)×880 mm (D)×1,590 mm (H)
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| Work height |
1,240mm
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| Weight |
580Kg
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| Model TW-1000 |
| Size |
Cleans devices up to 1,300 mm×1,700 mm
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| Dimensions |
17,200 mm (W)×1,200 mm (D)×2,700 mm (H)
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* Photomask cleaning system is custom-built according to the size of your photomasks. Please contact us for more details.
* The mask loading/unloading section is also custom-built to meet your requirements. Please contact us for more details.
