The UV-Ozone Cleaning System removes organic contaminants from work surfaces and can also be used for surface modification.
Surface treatment technology based on UV light is a dry cleaning which requires no vacuum system and can achieve a reliable cleaning effect without failure, and is further blessed with such a distinguished advantage that delicate work surface suffer no damage. UV Ozone cleaning is also effective for pre-cleaning and post-cleaning / final cleaning in wet processes.
This simple system for dry cleaning requires no complicated structure and is best used in final cleaning.
■UV Ozone Cleaning Mechanism
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UV Ozone Cleaning Mechanism
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| Ozone generation |
Ozone will be generated by oxygen in the atmosphere which absorbs the ultraviolet rays of 184.9nm.
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| Ozonolysis |
Generated ozone generate oxygen and active oxygen to absorb the ultraviolet rays of 253.7nm furthermore.
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Decomposition of
organic matter |
Highly unstable active oxygen tied to organic compound and do oxidative decomposition such as H2O, CO2, and NOx.
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UV Ozone cleaning systems, UV-208 and UV-312 by Technovision, are simple dry cleaning systems.
It is adopted high-density grid shaped low-pressure mercury lamp as the UV light source. It can irradiate uniformly to the entire work area.
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Features
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Equipped with a high-density UV grid lamp
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Uniformly irradiates work surfaces
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Small, compact design
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Simple utility
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Applicable to both double-side and single-side cleaning
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Simple operation with a safety lock function
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high-density UV grid lamp
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Uses
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For cleaning wafers, photomasks, glass substrates, and lenses and optical components.
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Surface modification of resin sections
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Improved contactabilty, enabling better adherence, coating, printing, deposition, and soldering
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Improvement of work surface wettability
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*A high-density UV grid lamp and power supply may be purchased separately.
